掺杂硅纳米线的研究进展

Development of research on doped silicon nanowire

  • 摘要: 掺杂是制备硅纳米线半导体器件的一个有效手段。介绍了掺杂硅纳米线的最新进展,主要就掺杂种类,包括硼、磷及锂掺杂硅纳米线,性能测量,包括光致发光特性、电子输运特性、场发射特性及其近端X射线吸收精细结构光谱等及在单电子探测器与计数器、存储元件、纳米线传感器等最新应用研究进展进行了较详细的讨论,最后对掺杂硅纳米线的发展前景作了展望。

     

    Abstract: Doping of silicon nanowire is one of effective meansto manufacture silicon nanowiresemi-conductor devices.The recent development of doped silicon nanowire was introduced.The kinds of silicon nanowire including boron,phosphorus and lithium doped silicon nanowire, the measurement of properties including photolumin escence characteristics,electrical transport characteristics,field mission characteristics and near edge X-ray absorption finestructurespectroscopy measurement,the recent application research development including single-electron detector and counter,memory cell and nanowire sensor etc.weredemonstrated respectively.At last, the promising prospect of doped silicon nanowire was discussed.

     

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