薄膜厚度对YBCO超导薄膜微结构及临界电流密度的影响
Effect of the thickness of YBCO film on microstructure and critical current density
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摘要: 用MOD方法在LAO基片上沉积不同厚度的YBCO薄膜。用X射线衍射仪对这一系列样品进行表征分析,研究随着薄膜厚度的增加微结构的变化及临界电流密度的变化。X射线衍射分析发现YBCO薄膜取向度随薄膜厚度的增加,在800nm时取得最佳值之后又随厚度增加由强变弱。晶格常数c随着膜厚的增加而增大。本研究对这一系列样品进行了φ扫描分析和摇摆曲线半高宽的计算,并对800nm的YBCO薄膜做了倒易空间图谱分析,实验结果发现800nm的YBCO薄膜晶化比较好。本研究还分析了薄膜厚度对YBCO薄膜临界电流密度的影响。Abstract: YBCO thin films with different thickness were deposited on LAO substrate by MOD method.Effect of the thickness of YBCO film on microstructure was studied by X-ray diffraction.Results show crystal orientation is improved with increasing YBCO films thickness the best value is observed at about 800nm and becomes weaker after 800nm;the lattice parameter c becomes bigger with increasing the thickness of films.Rocking curve FWHM and φ scanning of YBCO films with different thickness and reciprocal space mapping of the 800nm YBCO thin film were investigated.Results show crystallization of the 800nm YBCO thin film is better than others.Then,the effect of the thickness of YBCO film on critical current density was studied.
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