磁随机存储器总剂量效应及退火特性研究

Total Ionizing Dose effects and Annealing behaviors of Magnetoresistive Random Access Memory

  • 摘要: 本文对一款16Mb并口型磁随机存储器(MRAM)进行了Co60总剂量辐照和室温退火实验,深入研究了磁随机存储器的总剂量效应和退火特性。基于Verigy 93000芯片自动测试设备测试了磁随机存储器的直流/交流参数和功能,从中筛选出总剂量敏感参数,并根据敏感参数随总剂量及退火时间的变化趋势,深入分析了磁随机存储器总剂量效应的物理机制。研究表明辐照在器件浅槽隔离(STI)氧化物结构中产生的大量陷阱电荷,是导致芯片电参数失效的主要因素。总剂量辐照过程中产生的大量氧化物陷阱电荷在室温下发生退火效应,使得芯片的电参数和功能得到恢复。本文的实验数据和理论分析有助于国产宇航级磁存储器的研制开发。

     

    Abstract: Total ionizing dose effects by cobalt-60 and the following room temperature annealing behaviors of a 16 Mb commercial Magnetoresistive Random Access Memory(MRAM) are experimentally evaluated. DC, AC and function parameters of the memory during and after irradiation were tested by Verigy93000 chip Automatic Test Equipment(ATE). Radiation-sensitive parameters were given. According to variation trends of sensitive parameters, the physical mechanism of total ionizing dose effects and annealing characteristics of MRAM were analyzed in detail. It is shown that the large quantity of trapped charge in the structure of Shallow Trench Isolation( STI) oxide, generated by ionizing radiation, is the main reason to degrade memory performance. The large number of oxide-trapped charge recombined with the electrons coming from silicon substrate in room temperature is annealing, and gradually disappears. That’s why the functions and electrical parameters of MRAM were recovered quickly. The experimental data and analysis in this work are useful for radiation-tolerant MRAM development aiming at space applications.

     

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