沉积条件对CVD碳纤维生长的影响

Influence of deposition conditions on growth and structure of carbon fibers by CVD

  • 摘要: 用CH4、H2或包含NH3的混合气体为反应气体,利用负偏压增强热丝化学气相沉积方法在沉积有过渡层(Ta或Ti)和催化剂层(NiFe)的Si衬底上制备碳纤维,并用扫描电子显微镜研究了它们的生长和结构,结果发现不同的沉积条件对碳纤维的生长和结构有很大的影响。在无辉光放电的条件下,衬底温度较低时碳纳米管或纤维生长困难;提高衬底温度,能够弯曲生长;在辉光放电的条件下,则呈现定向生长的特点。

     

    Abstract: Carbon fibers were synthesized on Si substrates deposited with buffer layers (Ta or Ti) andNiFe catalyst layers by using bias-enhanced hot filament chemical vapor deposition method, using CH4,H2 or mixed gases containing NH3 as reaction gases. Growth and structure of carbon fibers were inves-tigated by scanning electron microscopy. It is found that different deposition conditions greatly affectthe growth and structure of carbon fibers. Without glow discharge, it is difficult to grow carbon fibers at low substrate temperature, the bent carbon fibers can be grown at higher substrate temperature. Withglow discharge, aligned carbon fibers can be obtained. The influence mechanism of different depositionconditions on growth and structure of carbon fibers is discussed in details.

     

/

返回文章
返回