AlGaN基日盲紫外探测器外延关键技术

Key Epitaxial Techniques for AlGaN-based Solar Blind Detectors

  • 摘要: 以AlGaN为代表的第三代宽禁带半导体材料是制备紫外探测器等光电器件的关键材料,是近年来国内外研究的热点。然而由于缺乏同质外延衬底,异质外延获得的AlGaN材料晶体质量普遍较差且高Al组分AlGaN掺杂困难,严重限制了紫外探测器的性能。制备高性能AlGaN基日盲紫外探测器的关键是外延生长高质量的AlGaN材料并实现高效掺杂。本文综述了AlGaN基日盲紫外探测器材料外延生长的关键技术以及国内外研究进展等。

     

    Abstract: The third-generation wide bandgap semiconductor materials represented by AlGaN is the key material for the preparation of optoelectronic devices such as ultraviolet detectors,and it has become domestic and foreign research hotspots in recent years.However,due to the lack of homoepitaxial substrates,the crystal quality of AlGaN material obtained by heteroepitaxy is generally poor,and the AlGaN doping in AlGaN of high Al composition is difficult,which seriously limits the performance of the UV detectors.Therefore,the key to the preparation of high-performance AlGaN-based solar-blind UV detectors is to grow high-quality AlGaN materials.In this paper,the key technologies for the epitaxial growth of AlGaN-based solar-blind UV detectors and their research progress at home and abroad are reviewed.

     

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