Pb2+与Al3+掺杂对SiO2薄膜电荷贮存性能的影响

INFLUENCE OF Pb2+ AND Al3+ DOPING ON SiO2 FILM ELECTRET PROPERTIES

  • 摘要: 较高的表面能是SiO2薄膜产生亲水性并导致体内贮存电荷失稳的重要原因。极性Pb2+离子的掺入有效地降低了SiO2薄膜的表面能,使表面趋于中性,增强了疏水性。此外,Pb2+、Al3+离子作为填隙式离子和替位式离子的掺入较好地改善了SiO2薄膜的网络结构并使其致密化,使样品在保持原有良好的负电荷存储性能基础上,又对称地增加了优良的正电荷贮存能力。这表明降低表面能和增强网络结构是提高SiO2薄膜驻电性能的有效途径,SiO2-PbO-Al2O3复合膜有希望成为一种新型无机驻极体材料。

     

    Abstract: High surface energy is the main reason of moisture intimacy in SiO2 thin film and leads to the decay of charges stored in the bulk. The doping of Pb2+ ions into SiO2 film reduces the surface energy effectively, makes the surface more neutral and thus enhances its moisture-resistant ability. Moreover, the doping of Pb2+, Al3+ ions as net-work modifiers and net-work formers reinforces the structure of SiO2 film, and adds new excellent positive charge storage capability and stability to the samples while reserving good properties of negative electret. It is indicated that surface energy reduction and net structure reinforcement are the effective way to improve the properties of SiO2 thin film electret, and there is a good prospect for the SiO2-PbO-Al2O3 compound film to become a new kind of inorganic electret material.

     

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