V<sub>2</sub>O<sub>5-x</sub>薄膜电极材料的氟化及性能研究

V₂O_5-x薄膜电极材料的氟化及性能研究

摘要: 用脉冲激光沉积法制备了V₂O_5-x氧化物薄膜电极材料,用XeF₂对其进行了氟化改性,并对比了电极材料氟化前后的充放电性能的变化。实验结果表明:氟化后的V₂O_5-x薄膜氟化后循环性能明显得到改善,经过200次循环充放电依然保持较高的充放电容量。

Abstract: Thin film electrode material V₂O_5-x was fabricated via pulsed laser deposition technique, and the films were fluorinated with XeF₂. Their electrochemical properties were compared with those before fluorinated. It shows that after fluorination, the charge-discharge cycle life of V₂O_5-x films is prolonged to more than 200 times with high capacities.