触摸屏金属桥Al膜层表面粗糙度控制及机理研究
Study on the Mechanism and Control of Surface Roughness of Aluminum Thin Film in the Metallic Bridge of Touch Screen
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摘要: Al薄膜作为钼/铝/钼三层金属桥的中间层,在电容式触摸屏中起到ITO图形搭桥的作用。金属Al在可见光范围内具有较高的反射率,导致在电容屏上有金属桥的部分反射率大于周边没有金属桥的部分,影响屏幕的显示效果。为了减少Al薄膜的反射率,可以采取增大Al薄膜表面粗糙程度的办法,增加漫反射。在不同的直流磁控溅射工艺下制备了表面粗糙度不同的Al薄膜,并分析了引起粗糙度不同的原因。得出了解决金属桥影问题的工艺条件。Abstract: Aluminum thin film is frequently used as the layer sandwiched between two Mo layers in the metallic bridge and acts as the function of connecting ITO pattern in the capacitive touch screen.The reflectivity of Aluminum is high for the visible light.As a result,reflectivity of the capacitive touch screen with the metallic bridge is higher than that without the metallic bridge,which affects the screen display effect.In order to reduce the reflectivity of Al film,its surface roughness is increased and then the same to the diffuse reflectance.Several Al thin films with different surface roughness are deposited by changing the DC magnetron sputtering conditions,and the reasons for different surface roughness are analyzed.The technological conditions to solve the problem of metallic bridge shadow are found.
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