多周期大尺寸均匀极化PPLN晶片的制备

Fabrication of homogenious poled PPLN wafer with multi-periods and large scale

摘要: 采用外加电场极化法,运用两步多次高电压脉冲触发的技术,成功地制备出均匀极化区面积为32mm×40mm、具有21个周期(Λ=27-31μm)、Z切0.5mm厚度的PPLN晶片。晶片的畴反转占空比接近50%,每一周期的大小为1.5mm×40mm,可用于大调谐范围的光参量振荡器。同时,实验给出了制备高品质PPLN晶片的高压触发脉冲的波形,其中,第一步高压触发脉冲为5μs,强度为100kV/mm,第二步高压触发脉冲宽度为50ms,强度为24kV/mm。

Abstract: Periodically Poled_Lithium Niobate(PPLN) wafer with homogeniously large poling area of 32mm×40mm was fabricated by means of a two-step poling technique.Ithas 21inverted domain periods ranging from 27μm to 31μm,and a Z-cut thickness of 0.5mm.The duty cycle of the inverted domain is close to 50%.The e xperimental pulsed waveforms for fa bricating PPLN wafer are presented,the width for the firs tstep poling voltage is 5μs,the intensity is 100kV/mm,and the width for the second step poling voltage is 50ms,the intensity is 24kV/mm.