不同衬底上Ba0.4Sr0.6TiO3铁电薄膜的制备及外延生长的研究

Fabrication of Ba0.4Sr0.6TiO3 Ferroelectric Films on Different Substrates and Research on Epitaxial Growth

  • 摘要: 利用脉冲激光沉积(PLD)技术,通过一系列实验成功地制备出了近外延生长的Ba0.4Sr0.6TiO2铁电薄膜。研究了衬底对Ba0.4Sr0.6TiO3铁电薄膜外延质量的影响。从摇摆曲线的半高宽(FWHM)及原子力显微镜(AFM)图谱中可以看出,在铝酸锶钽镧(LAST)衬底上生长的薄膜,外延质量明显比失配度更小的钛酸锶(STO)衬底上生长的要好,并不是传统认为的晶格失配度越小越好,分析其原因主要是因为小的失配不利于应力的释放造成的。

     

    Abstract: Using pulse laser deposition(PLD) technology,Ba0.4Sr0.6TiO3 ferroelectric films of approximately epitaxial growth were fabricated through a series of experiments.Effects of substrates on the quality of epitaxially grown Ba90.4) Sr0.6TiO3 ferroelectric films were researched.Though the mismatch between strontium titanate substrate(STO) and Ba0.4Sr0.6TiO3 ferroelectric film was the smallest,yet the full wave at half maximum(FWHM) of rocking curves and atomic force microscope(AEM) images indicate that the quality of epitaxially grown Ba0.4Sr0.6TiO3 ferroelectric films on lanthanum strontium aluminate tantalate (LAST) substrates was even better than grown on strontium titanate substrates.It is not the traditional view that the smaller lattice mismatch is the better.This is the main reason that the small mismatch will go against stress relief.

     

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