固体C70/GaAs接触的界面态及整流特性

Interface states and rectification of solid C70/GaAs contacts

  • 摘要: 在高真空系统中, 将C70膜淀积在(100)晶向n型和p型GaAs衬底上, 形成固体C70/n-GaAs和C70/p-GaAs两种接触。电学测量表明两种接触均是强整流结, 在偏压为± 1V时, 它们的整流比分别大于106和104, 以及在固定正向偏压下, 它们的电流都是温度倒数的指数函数, 从中确定了它们的有效势垒高度分别为0.784 eV和0.531 eV。深能级瞬态谱(DLTS)和C-t测量发现在C70/GaAs界面上存在一个电子陷阱E(0.640 eV)和一个空穴陷阱H3(0.822 eV), 以及在近界面的固体C70中存在两个空穴陷阱H4(1.155 eV)和H5(0.856 eV)。

     

    Abstract: Solid C70/GaAs contacts were made by vacuum deposition of solid C70 film on the n type and p typeepitaxial GaAs (100) substrates and their electrical properties were studied. It was found that these two kinds of contacts are strongly rectifying heterojunctions. The rectification ratio was higher than 106 and 104 for the C70/n-GaAs and C70/p-GaAs contacts at a bias of ±1V, respectively. At a fixed forward voltage, the current is an exponential function of reciprocal temperature, from which the effective barrier height was determined to be 0.784 eV and 0.531 eV for the C70/n-GaAsand C70/p-GaAs contacts, respectively. One electron trap, E(0.640 eV),and three hole traps, H3 (0.822 eV), H4 (1.155 eV) and H5 (0.856 eV ),were observed at and near the solid C70/GaAs interface by the deep level transient spectroscopy (DLTS)and C-t technique.

     

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