Abstract: Three groups of Al₂O₃ ceramic material with different surface morphology have been tested for the deposition of diamond film by using tungsten-filament chemical vapor deposition method from a gas mixture of C₂H₅OH and hydrogen. Their influence on nucleation and growth of diamond crystal on Al₂O₃ has been discussed. X-ray diffraction analysis, Raman spectrum and SEM show that high quality of polycrystalline diamond film has been obtained on Al₂O₃ ceramic material by HFCVD.