Abstract: ZnO/In₂O₃ multilayer films were prepared on glass substrate by DC magnetron sputtering and thermal oxidation.For different process parameters,such as layer number and corresponding film thickness,the structural,electrical and optical properties of ZnO/In₂O₃ multilayer films with fixed thickness were investigated.When the layer number of the ZnO/In₂O₃ multilayer films increases,the following results are observed.X-ray diffraction reveals that the intensity of In₂O₃ diffraction peaks decreases and ZnO diffraction peaks intends to some crystallite plane;Scanning electron microscopy images show that the multilayer layer surface becomes smoother and the diameters of ZnO grains on the surface are reduced;the four-point probe measure reveals that the square resistances are increased at low oxidation temperature and reduced at high oxidation temperature;the transmittance analysis indicates the average transmittance in visible wavelength region increases and the maximal transmittance shifts to short wavelength.