Abstract:
In this paper, p type low resistant ohmic contact for 2.5Gb□s DFB quantum well lasers were investigated using band engineering". A comparison was made between the nonalloyed Au-Pt-Ti□InAs□p
+-InGaAs□MQW□n-lnP and Au-Pt-Ti□p
+-InGaAs□MQW□n-InP p-type ohmic contact. Both samples were annealed at 400℃ for 30 seconds in N
2 ambient by means of rapid thermal processing after metal deposition.The current voltage (
I-
V) characteristics measured by semiconductor parameter analyzer showed that the series resistance of the former sample is 1/4 of the second one.