Abstract: Ag/Ni multilayer thin film on Si （111） substrates was measured by zero creep method.Substrate curvature measurements were performed on monitoring the stress history of Ag/Ni multiplayerthin film. It is found that Ag/Ni multilayer thin film attains a state of equilibrium at 450°C, and the stress at this state is 0.57MPa. The result of interfacial free energy γ_int of Ag/Ni is 0.63 J/m². The characteristics of Ag/Ni multilayer thin film were analyzed by XRD and SEM. Finally the stability of multilayer thin film was discussed through interfacial free energy.