hBN层厚对MoS2/hBN异质结纳米晶体管光电特性的影响

Effect of hBN Layer Thickness on Photoelectric Characteristics of MoS2/hBN Heterojunction Nanotransistors

  • 摘要: 采用第一性原理方法研究了单层二硫化钼(MoS2)在1到7层六方氮化硼(hBN)衬底上构成的垂直范德华异质结的电子结构的精细演变过程, 并对其光电特性进行了分析。不仅计算了hBN层数改变对异质结光学性质影响基础上, 还进一步研究了hBN层数改变对单层MoS2光学性质的影响, 最后计算了hBN层数改变对异质结势垒的影响。计算结果表明, MoS2/hBN范德华异质结作为栅介质构造的MoS2 FET, 可以借助二维半导体hBN层数的改变来调控其性质。研究结果为新一代基于MoS2的场效应晶体管和光电探测器的研发提供必要的理论基础。

     

    Abstract: The first-principles method is used to study the fine-grained evolution of the electronic structure of a vertical van der Waals heterojunction formed by a single layer of molybdenum disulfide (MoS2) on a 1 to 7 layer hexagonal boron nitride (hBN) substrate, and the characteristics are analyzed. In addition to calculating the influence of the number of hBN layers on the optical properties of heterojunctions, the effect of the number of hBN layers on the optical properties of single-layer MoS2 is also studied. The calculation results show that the MoS2/hBN van der Waals heterojunction as a gate dielectric MoS2 FET can adjust its properties by changing the number of two-dimensional semiconductor hBN layers. The research results provide the necessary theoretical basis for the development of a new generation of MoS2-based field effect transistors and photodetectors.

     

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