Abstract: A novel metalic two axis capacitive microaccelerometer is presented in this paper. An analytical formula, which is expressed as a function of the structural factor k, was used to optimize the design process, where k is simply the cantilever length l₁ over the total length (cantilever length + proof-mass length) l₂. Best sensitivity can be obtained while k=0.52. Nickel is used as the structure material. Its higher density is in favour of obtaining higher sensitivity. The sensitivity S 10%/g can be reached under following structure configurations: total length l₂=2750μm, cantilever length l₁=1430μm, proof mass width W=400μm, cantilever width w=25μm, gap between stationary electrode and seismic mass d=4μm. The inside proof mass structures and overall structure height (150μm) are also optimized in considering of the dumping ratio. The metalic structures are fabricated using well-known LIGA process on a silicon substrate. A two axis accelerometer can be easily made by this process. Two optical masks and one x-ray mask are needed for the device fabrication. The static capacity of the device is calculated 2.6pF. The open loop resonance frequency is 900Hz. Its working range is ± 5g. The chip size is about 4×4 mm.