原子层沉积氧化物纳米薄膜辅助的MOF薄膜制备:从原理到应用

MOF film growth assisted by atomic layer deposition of oxide nanomembrane: from principles to applications

  • 摘要: 金属有机框架(metal organic framework, MOF)是一类具有高比表面积、可调孔结构及丰富活性位点的多孔材料,在多领域展现出广泛的应用前景。然而,传统颗粒状MOF及常规薄膜制备方法存在团聚、与衬底结合不牢、性能失衡等问题,限制了其实际应用。而原子层沉积(atomic layer deposition, ALD)氧化物纳米薄膜辅助制备MOF薄膜的策略,利用了ALD致密、均匀且保形的优势,通过沉积金属氧化物(以ZnO为主)纳米薄膜辅助MOF薄膜生长,显著增强了其与各类衬底的结合力,实现了高质量、高负载量MOF薄膜的可控制备。本文详细阐述了ALD辅助MOF薄膜生长的方法及原理,揭示了氧化物纳米薄膜促进MOF成膜的具体机制,并总结了通过调整ALD参数、氧化物纳米薄膜种类及沉积策略以调控薄膜结构及提升性能的方法。此外,本文系统介绍了基于该方法制备的MOF薄膜基复合材料在气体与生物传感、能源转化、环境治理等领域的应用,并对该方法在大规模制备、机理深化及多功能集成等方面面临的挑战与未来发展方向进行展望。

     

    Abstract: Metal-organic frameworks (MOFs), a class of porous materials characterized by high specific surface areas, tunable pore structures, and abundant active sites, exhibit significant potential for application across multiple domains. However, conventional particulate MOFs and traditional thin-film preparation techniques often encounter challenges such as agglomeration, poor substrate adhesion, and performance degradation, which hinder their practical implementation. The approach of utilizing ALD of oxide nanomembranes to facilitate MOF film growth capitalizes on the inherent advantages of ALD, including its ability to produce dense, uniform, and conformal coatings. By depositing metal oxide (primarily ZnO) nanomembranes, this method promotes the growth of MOF films with enhanced substrate adhesion and enables the precise fabrication of high-quality, high-loading MOF films. This review provides a detailed explanation of the ALD-assisted MOF film growth methodology and its underlying principles, elucidates the specific mechanisms by which oxide nanomembranes enhance MOF film fabrication, and summarizes strategies for optimizing film structure and performance through adjustments to ALD parameters, oxide nanomembrane types, and deposition techniques. Additionally, the applications of MOF-based composites synthesized using this method in areas such as gas and biosensing, energy conversion, and environmental remediation are comprehensively reviewed. The challenges and future prospects of this technology, including large-scale fabrication, mechanistic insights, and multifunctional integration, are also discussed.

     

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