垂直沟道器件的研究与进展

Research and development of vertical channel MOSFETs

  • 摘要: 介绍了垂直沟道器件的常见结构和工艺,分析了垂直沟道器件的最新进展以及垂直沟道器件制作工艺中的最新技术,详细讨论了垂直沟道器件的性能,并分析了垂直沟道器件的优点以及存在的问题。

     

    Abstract: Typical configuration and correlative process of vertical channel MOSFETs are briefly introduced. The latest development as well as the novel process technology is presented also. Characteristics of the vertical channel MOSFETs are discussed in detail. Both the advantages and the disadvantages of the device are pointed out. The future developments are forecasted as well.

     

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